low temperature formation of emitter and bsf by rapid thermal co diffusion of p. al or b.pdf

LOW TEMPERATURE FORMATION OF EMITTER AND BSF BY RAPID
THERMAL CO-DIFFUSION OF P, Al or B
B. H RTITI’, S. SIVOTHTHAMAN*, R. SCHINDLER3, J. NIJS*, . MULLER’ and P. SIFFERT’
PCNRS, Laboratoire PHASE (UPR 292), BP 20,67037 STRASBOURG CEDEX 2 (France)
*lMEC, Kapeldreef 75, 3001 LEUVEN (Belgium)
3FhG-ISE, Oltmannsstr. 5,791OO FREIBURG i. Br. (Germany)
ABSTRACT by a conventional thermal oxidation leads to the
formation of solar cells with a % efficiency [4]. In a
Rapid thermal processing (RTP) is now emerging as a near future, we expect that all the thermal steps including
promising simplified process for manufacturing of surface passivation, AR coating and contact sintering
terrestrial solar cells in a continuous way. In earlier can be performed by RTP with a minimum number of
works, we have shown that RTP can advantageously cycles. This will contribute to simplify the production
replace classical furnace for performin emitter, BSF and lines of larae scale manufacturina processes.
surface passivation in addition to an e3r. rcrent . gettering of In this-work, we will show-that rapid thermal co-
metallic impurities during these steps. diffusion of P. Al or B is verv efficient to perform emitter
In this work, we present results about co-diffusion of and BSF for ‘silicon solar cells at a lower temperature
two dopant elements ‘in a si