小型化eacvd法金刚石膜沉积设备的控制系统研究（可复制）.pdf

南京航空航天大学硕士学位论文
摘要
化学气相沉积法(Chemical Vapor Deposition,简称 CVD)金刚石膜由于具
有独特的光学、热学和机械性能,在高科技领域具有广阔的应用前景。电子辅助
化学气相沉积(Electron-Assisted Chemical Vapor Deposition,简称 EACVD)是
制备金刚石膜的重要方法之一,它具有设备简单、生长易控制、膜层质量好等优
点。本文针对新开发的小型化 EACVD 金刚石膜沉积设备,设计出其嵌入式控制
系统,满足了金刚石薄膜制备的要求。主要工作如下:
,提出了采用模
糊 PID 参数自整定控制法来控制衬底温度,并建立了衬底温度控制的数学模型,
对所设计的模糊 PID 控制器进行了参数整定与优化、仿真分析和离散化处理。
SOC 型高速微处理器 C8051F020 为基础的小型化 EACVD 金刚
石膜沉积设备的控制系统,对系统的数据采集模块,控制输出模块,数据存储模
块,报警电路,人机交互界面,通信等模块进行了详细的设计。
Keil C51 开发环境下开发底层硬件驱动程序,开发了 SPI、I2C、UART
等通信接口协议;在控制系统硬件平台上移植µC/OS-II 嵌入式实时系统,在满
足实时性要求的同时使任务扩展更具灵活性。
µC/OS-II 嵌入式实时系统的基础之上进行应用程序的开发。开发了
Modbus RTU 协议、多点测温程序、A/D 采样和数据存储等软件模块,满足了系
统多任务和实时性的要求。
,沉积试验表明设计的嵌入式工控系统对金
刚石膜沉积设备的控制稳定、可靠,控制系统能够满足金刚石膜的制备要求。

关键词:控制系统,EACVD,金刚石膜,NCD,模糊 PID,C8051F020






I
小型化 EACVD 法金刚石膜沉积设备的控制系统研究
ABSTRACT
The CVD(Chemical Vapor Deposition) diamond film possesses remarkable
properties in mechanical, thermal, optical and electrical aspects, thus they have
potential application in the field of high technology. EACVD (Electron-Assisted CVD)
is one of the important methods for diamond film deposition. In this thesis, a kind of
intelligent integrated control system based on microcontroller was developed for the
miniature EACVD system which can realize the deposition of the diamond film under
unmanned situation.
The main work and results in this thesis are as follows:
The control strategy for the substrate temperature was studied. According to the
swing substrate platform and its temperature-control characteristic when preparing
diamond films, a fuzzy-PID self-tuning control system was introduced to control the
substrate temperature. The simulink module and the NCD module were used to
regulate and optimize the parameters of the controller. The controller was analyzed by
MATLAB simulation.
The hardware of a real-time control system was designed based on C8051F020