中国科技论文在线.pdf

第3卷第6期 2008 年 6 月 447 中国科技论文在线 SCIENCEPAPER ONLINE 高纯铝的电化学抛光工艺研究孙 俊,辛 森,毕 红(安徽大学化学化工学院,合肥 230039 ) 摘 要: 本文研究了高***酸/ 乙醇抛光液体系在 15 V 安全电压下高纯铝的抛光工艺以及抛光过程的电流密度, 并对“暗色膜”现象进行了解释,对抛光电极间距、操作温度对抛光效果的影响进行探讨,得出最佳抛光工艺: 电极间距 7~8 cm ,操作温度 10~15 ℃,电流密度 ~ A/m 2 ,抛光时间 3 min 。关键词: 电化学;电化学抛光;高纯铝;暗色膜中图分类号: O646 ; 文献标识码: A 文章编号: 1673 - 7180(2008)06 - 0447 - 5 Research on electrochemical polishing technics of high pure aluminum film SUN Jun , XIN Sen , BI Hong (College of Chemistry and Chemical Engineering, Anhui University, Hefei 230039) Abstract: A kind of electrochemical polishi ng technics for high pure aluminum film is studied in the polishing system of the HClO 4 /C 2 H 5OH under voltage of 15 V. The variation of current density and the appearence of “dark film” during polishing process are investigated . The influence of distan ce between electrodes and polishing temperature on polishing qua lity is also discussed in this pape r. The optimum technical parameters are obtained as follows: distance between electro des of 7~8 cm, polishing temperature of 10~15 ℃, current density of ~ A/m 2 and polishing time of 3 min. Key words: electrochemistry ; electrochemical polishing ; high pure aluminum ; dark film 0 引言自从 1991 年发现纳米管以来, 一维纳米材料由于具有独特的物理、化学特性和形状各向异性,在介观领域和纳米器件研制方面有着重要的应用前景,直至目前关于一维纳米材料的研究仍然相当活跃[1~2] 。多孔氧化铝模板由于具有高开孔密度、耐高温、绝缘性好、容易制备和剥离等优点,以及基于模板法可以结合其它多