氧气流量对TiOx 薄膜结构和光学特性的影响.pdf.pdf

第 41 卷第 1 期中南大学学报(自然科学版) Vo l .4 1
2010 年 2 月 Journal of Central South University (Science and Technology) Feb. 2010

氧气流量对 TiOx 薄膜结构和光学特性的影响

周继承,荣林艳,赵保星,李莉

(中南大学物理科学与技术学院,湖南长沙,410083)

摘要:用直流反应磁控溅射法在未加热的玻璃基片上制备出晶态 TiOx(x<2)薄膜,研究关键工艺因素即氧气流
量对薄膜的沉积速率、表面形貌、显微结构和光学特性的影响。研究结果表明:随着氧气流量增加,薄膜的沉积
速率从 nm/min 下降到 nm/min,溅射模式也从转变模式过渡到氧化模式,薄膜表面均方根粗糙度逐渐
减小,表面更趋平整;当氧气流量≤5 mL/min 时,得到不透明的晶态 TiOx(x<2)薄膜;当氧气流量>5 mL/min 时,
所沉积的 TiOx 薄膜呈透明非晶态,薄膜平均透射率高于 80%。
关键词:TiOx 薄膜;直流反应磁控溅射;氧气流量
中图分类号:O 484 文献标志码:A 文章编号:1672−7207(2010)01−0138−06

Influence of oxygen flow on structure and
optical properties of TiOx films

ZHOU Ji-cheng, RONG Lin-yan, ZHAO Bao-xing, LI Li

(School of Physics Science and Technology, Central South University, Changsha 410083, China)

Abstract: Well-crystallized structure TiOx(x<2= films were prepared on unheated glass by direct current (DC) reactive
ron sputtering. The influence of oxygen flow on deposition rate, microstructure, morphology and optical
properties was discussed. The results show that with the increase of the oxygen flow, the deposition rate decreases
significantly from nm/min to nm/min, which corresponds to sputtering transition from transition mode to
oxide mode, the surface root mean square roughness gradually decreases and film surface es smoother. When
oxygen flo