TiO2薄膜的LPCVD法制备、表征及光催化性能.pdf

28· 材料导报B:研究篇 2013年4月(下)第27卷第4期 TiO2薄膜的LPCVD法制备、表征及光催化性能梁建,马淑芳,赵君芙,许并社(太原理工大学材料科学与工程学院,教育部界面科学与工程重点实验室,太原030024) 摘要采用简单易行的低压化学气相沉积法(LPCVD)在GaAs、Si和玻璃衬底上沉积了Ti()2薄膜,通过 HRXRD、FESEM、EDS等手段对薄膜进行表征,结果表明基片对薄膜的晶相和微观形貌有明显的影响。薄膜的光催化实验结果显示,在可见光的照射下,分解甲基橙溶液时,砷化镓基和硅基TiO2薄膜表现出更强的光催化活性。并探讨了基片对薄膜晶相、微观形貌、光催化活性的影响。关键词低压化学气相沉积TiO2薄膜表面形貌光催化中图分类号:;TB43 文献标识码:A Preparation,Characterization,andPhotocatalysisPropertyof Ti02FilmsGrownbyLPCVD IdANGJian,MAShufang,ZHAOJunfu,XUBingshe (KeyLaboratoryofInterfaceScienceandEngineeringinAdvancedMaterialsofMinistryofEducation,Collegeof MaterialsScienceandEngineering,TaiyuanUniversityofTechnology,Taiyuan030024) Abstract TitaniumdioxidethinfilmsweregrewonGaAs,Si,andglasssubstratesbylowpressurechemical vapordeposition(LPCVD).ThethreefilmswerecharacterizedbyhighresoiutionX-raydiffraction(HRXRD),field emissionscanningelectronmicroscopy(FESEM)andenergydispersiveX-rayspectroscopy(EDS).Theresults showedthatthesubstratetypehadobviouseffectoncrystallinestructuresandsurfacemorphologiesofTiO2films. PhotocatalysistestresultsshowedtheTiOzfilmsdepositedonGaAsandSisubstratehadenhancedphotocatalyticac— paredwiththeTi08filmsdepositedon ,microstructure,photocatalysisproperty 0fTi02filmswerediscussedindetail. Keywords lowpressurechemicalvapordeposition,TiO8film,surfacemorphology,photocatalysis 0引言 1972年Fujishi