纳米二氧化硅改性负性光刻胶.pdf

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Thin Solid Films 516 (2008) 8399–840 thermal and dimensional stabilities of the photoresist due to silica
incorporation.
© 2008 Elsevier . All rights reserved.
Keywords: Photoresist; Binder; Sol–gel method; Organic–inorganic nanohybrid
1. Introduction measured and compared so as to optimize the thermal
mechanical and chemical stability properties of the photoresist.
Photoresists are widely used for the manufacture of Organic–inorganic hybrid materials have been extensively
microelectronics, silk screen printings, printed circuit boards, investigated in recent years [7–13]. Organic polymers, as
optical disks, color filter resists and so on. The recipe of a characterized by good flexibility, ductility and processability,
common negative-type photoresist consists of a binder, photo- have long been applied in various industries. In contrast,
sensitive polyfunctional monomer, photoinitiator, solvents and inorganic materials possess properties, such as high rigidity,
pigments [1–5]. For a photoresist applied in color filter, the mechanical strength, and thermal stability that are not
binder plays a vital role, as it determines the adhesion strength, achievable by polymers. Combin