(electro) Ipc 4554 Specification For Immertion Tin Plating For Printed Circuit Boards (final Draft Ii).pdf
IPC-4554 January 2006
Specification for Immersion Tin Plating for Printed Circuit Boards
FINAL DRAFT II
[By: 4-14 Plating Processes mittee]
Proposed by IPC 2215 Sanders Road, Northbrook, IL 60062 Phone : (847) 509-9700 Fax : (847) 509-9798 URL : Scope
This specification sets the requirements for the use of Immersion Tin (ISn) as a surface finish for printed circuit boards. This specification is intended to set requirements for ISn deposit thickness based on performance criteria. It is intended for use by supplier, manufacturer, contract manufacturer (CM) and original equipment manufacturer (OEM).
Description
ISn is a metallic finish deposited by a chemical displacement reaction that is applied directly over the basis metal of the PWB, copper. Primarily used as a solderable surface. It has been used in press fit connections and as the interface for Zero Insertion Force (ZIF) edge connectors.
The immersion tin protects the underlying copper from oxidation over its intended shelf life. Copper and tin however have a strong affinity for one another. The diffusion of one species into the other will occur inevitably, directly impacting the shelf life of the deposit and the performance of the finish.
The latest generation of immersion tin deposits utilize various methods of retarding the diffusion process, including the use of co-deposition anics, the use of another metal as a diffusion barrier or the use of grain structure refining. It is mended that the user of the deposit clearly understand the different methods of copper migration retardation and that the supplier know the positive and negative impacts of the system chosen.
Objective
This specification sets the requirements specific to ISn as a surface finish. As other finishes require specifications, they will be addressed by the IPC
(electro) Ipc 4554 Specification For Immertion Tin Plating For Printed Circuit Boards (final Draft Ii) 来自淘豆网www.taodocs.com转载请标明出处.